window
Availability: | |
---|---|
Quantity: | |
AM-CB04
Amber
AM-CB04
This Horizontal Flow Clean Bench utilizes the principle of horizontal laminar airflow to ensure that the work area is always dust and bacteria free, effectively protecting samples and materials from contamination. It is suitable for microbial culture, electronic component assembly, pharmaceutical preparation and other scenarios.
The principle of Horizontal Clean Bench is based on creating a controlled, unidirectional airflow that moves horizontally across a workspace to maintain a clean and particle-free environment. This principle is commonly used in horizontal laminar flow clean benches and other cleanroom equipment. The details as followings:
Air flow: After the air passes through the HEPA filter, it is blown to the working area in a horizontal, parallel and uniform manner, forming a laminar flow state.
Clean environment: The filtered clean air forms an air barrier to prevent outside contaminants from entering, while blowing contaminants in the work area toward the operator.
1.Preserves the samples and other materials from the contaminants and foreign pollution.
2.Easy to clean and maintain.
3.Molds a consistent and controlled environment to the students.
1.The Clean Bench does not encapsulate the operator from the dangerous components (as a biosafety cabinet does).
2.Recommended only for applications where the operator does not require shielding.
Specification
Width | 900mm, 1200mm, 1500mm, 1800mm and customizable |
Depth | 500mm, 600mm, 700mm |
Height | 800mm, 900mm, 1000mm |
Material | Cold rolled steel plate coating or stainless steel |
Horizontal Air Speed | Normally 0.3~0.6m/s (adjustable) |
Airflow | Normally 1000~2000m³/h |
Noise Levels | ≤65dB(A) |
Voltage | 220V/50Hz or 110V/60Hz. |
Power | 300W~800W (according to equipment size and fan power) |
This Horizontal Flow Clean Bench utilizes the principle of horizontal laminar airflow to ensure that the work area is always dust and bacteria free, effectively protecting samples and materials from contamination. It is suitable for microbial culture, electronic component assembly, pharmaceutical preparation and other scenarios.
The principle of Horizontal Clean Bench is based on creating a controlled, unidirectional airflow that moves horizontally across a workspace to maintain a clean and particle-free environment. This principle is commonly used in horizontal laminar flow clean benches and other cleanroom equipment. The details as followings:
Air flow: After the air passes through the HEPA filter, it is blown to the working area in a horizontal, parallel and uniform manner, forming a laminar flow state.
Clean environment: The filtered clean air forms an air barrier to prevent outside contaminants from entering, while blowing contaminants in the work area toward the operator.
1.Preserves the samples and other materials from the contaminants and foreign pollution.
2.Easy to clean and maintain.
3.Molds a consistent and controlled environment to the students.
1.The Clean Bench does not encapsulate the operator from the dangerous components (as a biosafety cabinet does).
2.Recommended only for applications where the operator does not require shielding.
Specification
Width | 900mm, 1200mm, 1500mm, 1800mm and customizable |
Depth | 500mm, 600mm, 700mm |
Height | 800mm, 900mm, 1000mm |
Material | Cold rolled steel plate coating or stainless steel |
Horizontal Air Speed | Normally 0.3~0.6m/s (adjustable) |
Airflow | Normally 1000~2000m³/h |
Noise Levels | ≤65dB(A) |
Voltage | 220V/50Hz or 110V/60Hz. |
Power | 300W~800W (according to equipment size and fan power) |